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Many
applications in the optoelectronic industry use glass
as a substrate, rather than silicon which is commonly
used in the semiconductor industry. SiO 2 is often used
as a low refractive index material in the construction
of DW multilayer cavities.
There
is very little difference between the refractive indices
of the substrate and the layer, so that reflectivities
are very small.
The
Picometer
has very high sensitivity, and has the sensitivity to
study these low contrast interfaces.
The high speed of the Picometer makes it ideal for incorporation
into the fab process.
The Imaging
Ellipsometer is able to image the cut and coated
ends of individual fibers, and can make spectroscopic
ellipticity or reflectivity measurements to confirm
antireflection properties.
See
Examples and Application
notes.
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