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Many applications in the
optoelectronic industry use glass as a substrate, rather than silicon which is
commonly used in the semiconductor industry. SiO2 is often used as a low refractive
index material in the construction of DW multilayer cavities.
There
is very little difference between the refractive indices of the substrate and
the layer, so that reflectivities are very small. The
Picometer has very high sensitivity,
and has the sensitivity to study these low contrast interfaces.
The high speed of the Picometer makes it ideal for incorporation into the fab
process.
The Imaging Ellipsometer
is able to image the cut and coated ends of individual fibers, and can make spectroscopic
ellipticity or reflectivity measurements to confirm antireflection properties. See
Examples and Application
notes.
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